20 August 2004 Advanced photomask repair technology for 65-nm lithography (1)
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Proceedings Volume 5446, Photomask and Next-Generation Lithography Mask Technology XI; (2004) https://doi.org/10.1117/12.557789
Event: Photomask and Next Generation Lithography Mask Technology XI, 2004, Yokohama, Japan
Abstract
The 65nm photomasks have to meet tight specifications and improve the production yield due to high production cost. The 65nm optical lithography has two candidates, 157nm and 193nm, and we are developing two types of experimental photomask repair systems, FIB and EB, for the 65nm generation. We designed and developed FIB and EB beta systems. The platforms of beta systems consist of anti-vibration design to reduce outer disturbance for repair accuracy. Furthermore, we developed a new CPU control system, especially the new beam-scanning control system that makes it possible to control the beam position below nanometer order. These developments will suppress transmission loss and improve repair accuracy of the systems. We also adopt the 6-inch mask SMIF pod system and the CAD data linkage system that matches the EB mask data image with the SED image to search defects in photomasks with sophisticated patterns such as OPC patterns. We evaluate the EB repair process, and confirm that it generates carbon film, which has possibility to generate the same quality as that of FIB. Furthermore, we confirmed that EB and FIB repair systems were able to deposit carbon film and etch chrome, quartz, and MoSi. In this paper, we report the photomask defect repair experimental systems and the feasibility study on photomask defect repair for the 65nm generation.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yasutoshi Itou, Yasutoshi Itou, Yoshiyuki Tanaka, Yoshiyuki Tanaka, Nobuyuki Yoshioka, Nobuyuki Yoshioka, Yasuhiko Sugiyama, Yasuhiko Sugiyama, Ryoji Hagiwara, Ryoji Hagiwara, Haruo Takahashi, Haruo Takahashi, Osamu Takaoka, Osamu Takaoka, Junichi Tashiro, Junichi Tashiro, Katsumi Suzuki, Katsumi Suzuki, Mamoru Okabe, Mamoru Okabe, Syuichi Kikuchi, Syuichi Kikuchi, Atsushi Uemoto, Atsushi Uemoto, Anto Yasaka, Anto Yasaka, Tatsuya Adachi, Tatsuya Adachi, Naoki Nishida, Naoki Nishida, Toshiya Ozawa, Toshiya Ozawa, } "Advanced photomask repair technology for 65-nm lithography (1)", Proc. SPIE 5446, Photomask and Next-Generation Lithography Mask Technology XI, (20 August 2004); doi: 10.1117/12.557789; https://doi.org/10.1117/12.557789
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