Evaluation of image placement of EPL stencil masks

Satoshi Yusa; Mikio Ishikawa; Yoshinori Kinase; Tadahiko Takikawa; Hiroshi Fujita; Hisatake Sano; Morihisa Houga; Naoya Hayashi

doi:10.1117/12.557774

20 August 2004 Evaluation of image placement of EPL stencil masks

Satoshi Yusa, Mikio Ishikawa, Yoshinori Kinase, Tadahiko Takikawa, Hiroshi Fujita, Hisatake Sano, Morihisa Houga, Naoya Hayashi

Author Affiliations +

Proceedings Volume 5446, Photomask and Next-Generation Lithography Mask Technology XI; (2004) https://doi.org/10.1117/12.557774
Event: Photomask and Next Generation Lithography Mask Technology XI, 2004, Yokohama, Japan

Abstract

200-mm stencil masks for electron beam projection lithography (EPL) have been developed. Since they are not so rigid as photomasks because of their structure, 200-mm wafers with about 8,000 membrane windows, new metrological techniques dedicated to stencil masks have be introduced. Image placement (IP) accuracy of an EPL mask is evaluated with a suspension-type electrostatic chuck introduced to a Leica LMS IPRO. The dynamic repeatability of global IP measurements was 27 nm (3σ). It was confirmed that global IP errors were reduced to 60 nm (3σ, max) by linear-term and gravity corrections.

Citation Download Citation

Satoshi Yusa, Mikio Ishikawa, Yoshinori Kinase, Tadahiko Takikawa, Hiroshi Fujita, Hisatake Sano, Morihisa Houga, and Naoya Hayashi "Evaluation of image placement of EPL stencil masks", Proc. SPIE 5446, Photomask and Next-Generation Lithography Mask Technology XI, (20 August 2004); https://doi.org/10.1117/12.557774

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