20 August 2004 LEEPL data conversion system
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Proceedings Volume 5446, Photomask and Next-Generation Lithography Mask Technology XI; (2004); doi: 10.1117/12.557778
Event: Photomask and Next Generation Lithography Mask Technology XI, 2004, Yokohama, Japan
Abstract
PATACON-LEEPL is a software product for converting semiconductor mask CAD data to the EB data of masks for LEEPL transcribing devices. This software has several functions, such as pattern placement function corresponding to the structure of the LEEPL mask, which is different from the mask for optical steppers, complementary division function for stencil masks, correction of distortion due to mask internal stress, and alignment mark insertion. This software operates in the environment in which several to some hundreds of Linux PC's are connected by a high-speed network.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Masahiro Shoji, Nobuyasu Horiuchi, "LEEPL data conversion system", Proc. SPIE 5446, Photomask and Next-Generation Lithography Mask Technology XI, (20 August 2004); doi: 10.1117/12.557778; https://doi.org/10.1117/12.557778
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KEYWORDS
Data conversion

Photomasks

Charged-particle lithography

Computer aided design

Inspection

Distortion

Data corrections

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