20 August 2004 Status and issues of EPL
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Proceedings Volume 5446, Photomask and Next-Generation Lithography Mask Technology XI; (2004) https://doi.org/10.1117/12.557818
Event: Photomask and Next Generation Lithography Mask Technology XI, 2004, Yokohama, Japan
Abstract
Electron projection lithography (EPL) is a viable candidate for moderate-volume production of systems-on-a-chip (SoC) for the 65 nm node and beyond. Making EPL a realistically applicable technology depends strongly on how well its infrastructure is developed. Many developments related to EPL, including those by Selete, are currently under way. The world's first full-field EPL exposure tool, the Nikon EB stepper, NSR-EB1A, was shipped to Selete. In the installation stage, the tool produced 70 nm line and space, 50 nm isolated line, and 80 nm contact hole resolution. EPL resist performance is approaching 50 nm resolution and 5 μC/cm2 sensitivity and commercial availability. Sample EPL stencil masks are also available from three mask suppliers in Japan. Beta mask defect inspection and repair are also available, as is data processing software for EPL mask making. Such software has reduced processing time and data volume using PC clusters and hierarchical processing. The results of the first of EPL trial device fabrication showed good resolution for hole patterns at about 70 nm and the usefulness of EPL in hole delineation. EPL is thus being steadily improved and elements are commercially available, underscoring EPL's feasibility as a practical technology. Issues that remain to be solved include better EB stepper performance, faster resist, more accurate masks, the demonstration of practical inspection and repair tools, and verification software. These issues are, it should be noted, engineering issues rather than basic EPL issues. EPL remains the most promising candidate for the 65 nm node and beyond, especially for hole delineation. Selete is continuing EPL development, working with suppliers of exposure tools, resist, masks, and inspection and repair tools, and software targeting lithography for 65 nm, 45 nm, and 32 nm nodes.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Masaki Yamabe, Masaki Yamabe, } "Status and issues of EPL", Proc. SPIE 5446, Photomask and Next-Generation Lithography Mask Technology XI, (20 August 2004); doi: 10.1117/12.557818; https://doi.org/10.1117/12.557818
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