20 August 2004 Surface organic compound contamination as a significant factor in substrate transmittance reduction in the VUV region
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Proceedings Volume 5446, Photomask and Next-Generation Lithography Mask Technology XI; (2004) https://doi.org/10.1117/12.557722
Event: Photomask and Next Generation Lithography Mask Technology XI, 2004, Yokohama, Japan
Abstract
Organic compound contamination in a clean room is presently attracting attention as a serious problem in F2 laser lithography. Certain organic compounds may possibly have absorption spectra in the vacuum ultra violet region (VUV), as has been indicated by various theoretical considerations. But the effects of organic compounds present on a substrate surface are as yet unclarified. This study was conducted to determine whether organic compounds on the surface of a substrate serve significantly to reduce the transmittance of the substrate. The substrates of F-doped SiO2 glass and MgF2 were made to adsorb organic compounds by two different methods. Transmittance was measured at 130 to 200nm and clearly found to decrease as a result of organic compound contamination. In the case of dry-cleaned substrates, transmittance was recovered to its original level. It thus follows from these findings that substrate transmittance is significantly reduced by organic compound contamination on the substrate surface in the VUV region.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kyoko Sakai, Yo Sakata, Yuichi Fukushima, and Yasuhiro Okumoto "Surface organic compound contamination as a significant factor in substrate transmittance reduction in the VUV region", Proc. SPIE 5446, Photomask and Next-Generation Lithography Mask Technology XI, (20 August 2004); doi: 10.1117/12.557722; https://doi.org/10.1117/12.557722
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