20 August 2004 The influence of spatio-temporal variation of temperature distribution in a polymer solution on a flat substrate on formation of polymer film's thickness distribution during the drying process, based on results of simulation of the modified model
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Proceedings Volume 5446, Photomask and Next-Generation Lithography Mask Technology XI; (2004) https://doi.org/10.1117/12.557711
Event: Photomask and Next Generation Lithography Mask Technology XI, 2004, Yokohama, Japan
Abstract
We did many numerical simulation of the modified model of drying process for the flat polymer (resist) film fabrication taking effects of latent heat and heat conductivity into account and studied effects of introducing latent heat and heat conductivity to the model. From those we clarified dependence of distribution of resist molecules on a substrate on latent heat of solvent. Moreover, we clarified why above characteristic dependence of distribution of resist molecules on latent heat appeared.
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Hiroyuki Kagami, "The influence of spatio-temporal variation of temperature distribution in a polymer solution on a flat substrate on formation of polymer film's thickness distribution during the drying process, based on results of simulation of the modified model", Proc. SPIE 5446, Photomask and Next-Generation Lithography Mask Technology XI, (20 August 2004); doi: 10.1117/12.557711; https://doi.org/10.1117/12.557711
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