20 August 2004 The masks fabricated by UV LIGA for excimer laser ablation and x-ray lithography
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Proceedings Volume 5446, Photomask and Next-Generation Lithography Mask Technology XI; (2004) https://doi.org/10.1117/12.557781
Event: Photomask and Next Generation Lithography Mask Technology XI, 2004, Yokohama, Japan
In the present paper, a mask structure called adhering mask for excimer laser ablation is introduced. This mask is fabricated directly on the etched material, so it needn't a supporting chip and it thus has high transmission. Its absorber is made of gold and is fabricated by UV LIGA technology. Therefore the mask has more accurate structure and more smooth edges. This mask can fulfill the direct etching of the polymers by using a simpler optical system and can be a method of the mass production to some extent. The other mask is developed for X-ray lithography. It is made by UV LIGA process too. It consists of the substrate, the absorber and the supporter. The substrate is made of PI and the absorber is prepared by gold. The structure, fabrication process and experiment results of this mask are given.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jingqiu Liang, Jingqiu Liang, Zichun Le, Zichun Le, Weibiao Wang, Weibiao Wang, Liangqiang Peng, Liangqiang Peng, Weihua Lan, Weihua Lan, Anjie Ming, Anjie Ming, Jian Ye, Jian Ye, Bisheng Quan, Bisheng Quan, Jinsong Yao, Jinsong Yao, Ming Xuan, Ming Xuan, Lijun Wang, Lijun Wang, } "The masks fabricated by UV LIGA for excimer laser ablation and x-ray lithography", Proc. SPIE 5446, Photomask and Next-Generation Lithography Mask Technology XI, (20 August 2004); doi: 10.1117/12.557781; https://doi.org/10.1117/12.557781


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