Translator Disclaimer
Paper
20 August 2004 Visible-light inspection of EUVL multilayer mask blanks
Author Affiliations +
Proceedings Volume 5446, Photomask and Next-Generation Lithography Mask Technology XI; (2004) https://doi.org/10.1117/12.557772
Event: Photomask and Next Generation Lithography Mask Technology XI, 2004, Yokohama, Japan
Abstract
Mask blank inspection is a critical issue in EUV lithography. Visible-light inspection has the advantages of a high throughput and a low tool cost, while actinic inspection potentially has a high inspection capability. The Hamamatsu Photonics Super Fine Particle Detection System, which employs dark-field scattering optics, has a high detection sensitivity and throughput. It is able to detect PSL spheres with diameters below 50 nm on a Si substrate. So, we tried using it to detect fine PSL spheres on Mo/Si multilayer mask blanks. 60-nm PSL spheres were detected, but noise arising from the surface roughness of the Mo/Si multilayer prevented the accurate detection of PSL spheres with diameters of less than 50 nm. Thus, it is important to reduce the surface roughness of the multilayer in order to improve the inspection capability of visible-light inspection systems.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Takeo Hashimoto, Hiromasa Yamanashi, Shinji Miyagaki, and Iwao Nishiyama "Visible-light inspection of EUVL multilayer mask blanks", Proc. SPIE 5446, Photomask and Next-Generation Lithography Mask Technology XI, (20 August 2004); https://doi.org/10.1117/12.557772
PROCEEDINGS
10 PAGES


SHARE
Advertisement
Advertisement
RELATED CONTENT

SEMATECH EUVL mask program status
Proceedings of SPIE (May 11 2009)
EUVL mask fabrication for the 45-nm node
Proceedings of SPIE (August 01 2002)
An investigation of EUV lithography defectivity
Proceedings of SPIE (October 17 2008)

Back to Top