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20 September 2004 A high-power short-pulse laser for EUV source generation using laser-produced plasma and achieving low cost of ownership
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Proceedings Volume 5448, High-Power Laser Ablation V; (2004) https://doi.org/10.1117/12.549228
Event: High-Power Laser Ablation, 2004, Taos, New Mexico, United States
Abstract
Powerlase has made significant advances towards making the LPP EUV source the most likely choice for a full production EUV lithography machine. Our main achievement was enhancing the performance of the LPP driver and particularly increasing the average power per laser module. This was achieved by increasing the electrical to optical conversion efficiency of our gain modules. In order to increase the conversion efficiency of the in-band EUV, we are currently using cryogenic solid xenon, as well as other target materials. The combination of an efficient and cost effective laser driver with appropriate choice of target material significantly lowers the Cost of Ownership (CoO) of the LPP EUV source, including day to day running, making it comparable to the cost of Discharge Produced Plasma (DPP) sources.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andy J. Comley, Samir Ellwi, Nick Hay, and Michael F. Brownell "A high-power short-pulse laser for EUV source generation using laser-produced plasma and achieving low cost of ownership", Proc. SPIE 5448, High-Power Laser Ablation V, (20 September 2004); https://doi.org/10.1117/12.549228
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