Translator Disclaimer
20 September 2004 High-resolution EUV Microstepper tool for resist testing and technology evaluation
Author Affiliations +
Proceedings Volume 5448, High-Power Laser Ablation V; (2004)
Event: High-Power Laser Ablation, 2004, Taos, New Mexico, United States
Key features are presented of the Exitech MS-13 EUV Microstepper tool developed for EUV resist testing & technology evaluation at the 32nm node and beyond. Details of the tool design architecture, module layout, vacuum chamber, major subsystems including source, optics and performance specifications are given.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Adam Brunton, Julian S. Cashmore, Peter Elbourn, Graeme Elliner, Malcolm C. Gower, Philipp Grunewald, M. Harman, S. Hough, N. McEntee, S. Mundair, D. Rees, P. Richards, V. Truffert, Ian Wallhead, and Michael D. Whitfield "High-resolution EUV Microstepper tool for resist testing and technology evaluation", Proc. SPIE 5448, High-Power Laser Ablation V, (20 September 2004);


EUV photomask defects what prints, what doesn't, and what...
Proceedings of SPIE (October 23 2015)
EUV mask simulation for AIMS
Proceedings of SPIE (December 17 2003)
Progress of the EUVL alpha tool
Proceedings of SPIE (August 20 2001)

Back to Top