20 September 2004 Nanostructure fabrication by femtosecond laser with near-field optical enhancement effect
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Proceedings Volume 5448, High-Power Laser Ablation V; (2004) https://doi.org/10.1117/12.546828
Event: High-Power Laser Ablation, 2004, Taos, New Mexico, United States
Abstract
We will report on nanostructure fabrication on silicon (Si) substrate by 800 nm femtosecond laser pulses. Spherical alumina particles were placed on the substrate surface. After femtosecond laser irradiation at below-ablation-threshold fluences, we have successfully observed the nanoholes formation with around 100 nm in diameter using scanning electron microscope (SEM) and atomic force microscope (AFM). The dependence of nanohole formation on the laser fluence and laser pulse number was investigated. The mechanism for the nanohole drilling is the near-field optical enhancement effect induced by interaction between local surface plasmon on the particles surface and surface plasmon polariton on the Si substrate surface.
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Hiroto Takada, Hiroto Takada, Masanao Kamata, Masanao Kamata, Yoshihiro Hagiwara, Yoshihiro Hagiwara, Minoru Obara, Minoru Obara, } "Nanostructure fabrication by femtosecond laser with near-field optical enhancement effect", Proc. SPIE 5448, High-Power Laser Ablation V, (20 September 2004); doi: 10.1117/12.546828; https://doi.org/10.1117/12.546828
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