15 September 2004 Slitmasks from observer to telescope: astrometric slitmask manufacturing and control for Keck spectrographs
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Abstract
This paper documents the astrometric slitmask design, submission, fabrication, control and configuration tools used for two large spectrographs at W. M. Keck Observatory on Mauna Kea, Hawai'i. For supplemental illustrations and documents, including an online version of the poster and interactive demos, we refer the reader to http://spg.ucolick.org/Docs/SPIE/2004 .
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
De A. Clarke, De A. Clarke, Steven L. Allen, Steven L. Allen, Gregory D. Wirth, Gregory D. Wirth, Andrew C. Phillips, Andrew C. Phillips, } "Slitmasks from observer to telescope: astrometric slitmask manufacturing and control for Keck spectrographs", Proc. SPIE 5496, Advanced Software, Control, and Communication Systems for Astronomy, (15 September 2004); doi: 10.1117/12.552300; https://doi.org/10.1117/12.552300
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