Projection Photolithography For Microwave LSI-IC Applications

Douglas Ritchie

doi:10.1117/12.954253

1 March 1974 Projection Photolithography For Microwave LSI-IC Applications

Douglas Ritchie

Proceedings Volume 0055, Technological Advances in Micro and Submicro Photofabrication Imagery; (1974) https://doi.org/10.1117/12.954253
Event: Acquisition and Analysis of Pictorial Data, 1974, San Diego, United States

Abstract

Projection printing techniques have been developed and applied to the fabrication of fine pattern microwave integrated circuits. This paper deals with details of the applied projection printing tech-nologies through utilization of a commercially available projection printing system with magnification of 1/2. Results are reported for minimum pattern widths of the order of 1 to 2 microns produced in both positive and negative photoresist films on Si0₂ and metallic substrates. Of particular concern are processing problems peculiar to the reduction projection method as it relates to the fabrication of integrated circuit structures.

Citation Download Citation

Douglas Ritchie "Projection Photolithography For Microwave LSI-IC Applications", Proc. SPIE 0055, Technological Advances in Micro and Submicro Photofabrication Imagery, (1 March 1974); https://doi.org/10.1117/12.954253

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