2 June 2004 Contact layer printing using alternating phase-shifting masks: mask making, patterning results, and production implementation
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Proceedings Volume 5504, 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents; (2004) https://doi.org/10.1117/12.568032
Event: 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents, 2004, Dresden, Germany
Abstract
Contact layers of the DRAM manufacturing process can be printed well using alternating phase-shifting masks. State-of-the-art mask making tools have sufficient performance to manufacture defect free contact masks. The enlarged process window compared to conventional masks allows to shrink the contacts size or to substitute advanced scanners by older generation steppers for contact layer patterning. Using older generation exposure systems may cause problems originating in worse lens aberration performance. A method will be described how to overcome overlay problems by applying a specifically designed OL measurement target.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Rainer Pforr, Rainer Pforr, Wolfgang Dettmann, Wolfgang Dettmann, M. Eisenhut, M. Eisenhut, Mario Hennig, Mario Hennig, Detlef Hofmann, Detlef Hofmann, Joerg Thiele, Joerg Thiele, Guido Thielscher, Guido Thielscher, "Contact layer printing using alternating phase-shifting masks: mask making, patterning results, and production implementation", Proc. SPIE 5504, 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents, (2 June 2004); doi: 10.1117/12.568032; https://doi.org/10.1117/12.568032
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