14 October 2004 Physisorbed buffer layer as a template for pulsed laser patterning of metallic thin films: an alternative approach for photolithography
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Abstract
Buffer Layer Assisted Laser Patterning (BLALP) method is presented, for patterning metallic layers on surfaces, using laser desorption of a physisorbed buffer layer, e.g. Xe, CO2 or H2O. This technique is based on the utilization of a low power laser pulse used as the photolithographic printer of a metallic thin film. Using a weakly bound buffer material as the template for laser patterning, led to the development of two complementary procedures, 'positive' and 'negative' BLALP. It is discussed as a potential alternative for standard photo-lithography, promising a cleaner, more cost effective, better resolution and more environmentally friendly procedure.
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Gabriel Kerner, Gabriel Kerner, Ori Stein, Ori Stein, Micha Asscher, Micha Asscher, } "Physisorbed buffer layer as a template for pulsed laser patterning of metallic thin films: an alternative approach for photolithography", Proc. SPIE 5513, Physical Chemistry of Interfaces and Nanomaterials III, (14 October 2004); doi: 10.1117/12.557621; https://doi.org/10.1117/12.557621
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