18 October 2004 Physical model for near-field scattering and manipulation
Author Affiliations +
Abstract
We present a physical model for the conversion of the evanescent photons into propagating photons detectable by an imaging system. The conversion mechanism consists of two physical processes, near-field Mie scattering enhanced by morphology dependant resonance and vectorial diffraction. For dielectric probe particles, these two processes lead to the formation of an interference-like pattern in the far-field of a collecting objective. The detailed knowledge of the far-field structure of converted evanescent photons is extremely important for designing novel detection systems. The model is also applicable for determination of the near-field force exerted on small particles situated in an evanescent field. This model should find broad applications in near-field imaging, optical nanometry and near-field metrology.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Djenan Ganic, Xiaosong Gan, Min Gu, "Physical model for near-field scattering and manipulation", Proc. SPIE 5514, Optical Trapping and Optical Micromanipulation, (18 October 2004); doi: 10.1117/12.555746; https://doi.org/10.1117/12.555746
PROCEEDINGS
8 PAGES


SHARE
Back to Top