Laser thermal patterning of OLED materials

Martin B. Wolk; John P. Baetzold; Erika Bellmann; Thomas R. Hoffend Jr.; Sergey Lamansky; Yingbo Li; Ralph R. Roberts; Vadim Savvateev; John S. Staral; William A. Tolbert

doi:10.1117/12.563872

10 November 2004 Laser thermal patterning of OLED materials

Martin B. Wolk, John P. Baetzold, Erika Bellmann, Thomas R. Hoffend Jr., Sergey Lamansky, Yingbo Li, Ralph R. Roberts, Vadim Savvateev, John S. Staral, William A. Tolbert

Author Affiliations +

Proceedings Volume 5519, Organic Light-Emitting Materials and Devices VIII; (2004) https://doi.org/10.1117/12.563872
Event: Optical Science and Technology, the SPIE 49th Annual Meeting, 2004, Denver, Colorado, United States

Abstract

Laser Induced Thermal Imaging (LITI) is a high resolution, digital patterning technique developed at 3M for use in a number of applications including the patterning of LCD color filters and OLED emitters. The LITI process is suited for the manufacture of flat panel displays, where both high resolution and absolute placement accuracy are required. In this paper, we present the capabilities of LITI, the basic design of a LITI laser imager, the construction of a LITI donor sheet, and the process by which OLED emitters may be patterned. An OLED device fabricated with the LITI process is described.

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Martin B. Wolk, John P. Baetzold, Erika Bellmann, Thomas R. Hoffend Jr., Sergey Lamansky, Yingbo Li, Ralph R. Roberts, Vadim Savvateev, John S. Staral, and William A. Tolbert "Laser thermal patterning of OLED materials", Proc. SPIE 5519, Organic Light-Emitting Materials and Devices VIII, (10 November 2004); https://doi.org/10.1117/12.563872

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