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29 September 2004 Investigation of damage threshold of ion beam deposited oxide thin film optics for high-peak-power short-pulse lasers
Ann M. Fitzgerald Dummer, Fernando Brizuela, Charissa Duskis, Brad Luther, Miguel Larotonda, Jorge J. Rocca, Jason George, Sandeep Kohli, Pat McCurdy, Carmen S. Menoni
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Proceedings Volume 5527, Advances in Thin Film Coatings for Optical Applications; (2004) https://doi.org/10.1117/12.559903
Event: Optical Science and Technology, the SPIE 49th Annual Meeting, 2004, Denver, Colorado, United States
Abstract
In this work we report on the damage threshold of ion beam deposited oxide films designed for high peak power short pulse laser systems. Single layers of ZrO2, SiO2, Al2O3, TiO2, and Ta2O5 and multilayers of Al2O 3/TiO2, SiO2/Ta2O5, and SiO2/ZrO2 were grown on polished borosilicate glass substrates using ion beam sputter deposition. Deposition conditions were optimized to yield fully oxidized films as determined from x-ray photoelectron spectroscopy (XPS). Damage threshold testing was performed using an amplified Ti:Sapphire laser producing a train of 120 picosecond pulses at a wavelength of 800 nm. The laser output was focused with a lens to generate fluences ranging from 0.1 to 24 J/cm2. The highest damage threshold of 15.4 J/cm2 was measured for a single layer film of SiO2. The damage threshold of high reflectance and anti-reflection multilayer coatings fabricated for 800 nm applications was evaluated using the same procedure as for the single layer films. Highest damage thresholds of 2.5 and 3.5 J/cm2 were measured for a 6-pair ZrO2/SiO2 high reflectance coating and a 5 layer anti-reflection coating of the same materials.
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Ann M. Fitzgerald Dummer, Fernando Brizuela, Charissa Duskis, Brad Luther, Miguel Larotonda, Jorge J. Rocca, Jason George, Sandeep Kohli, Pat McCurdy, and Carmen S. Menoni "Investigation of damage threshold of ion beam deposited oxide thin film optics for high-peak-power short-pulse lasers", Proc. SPIE 5527, Advances in Thin Film Coatings for Optical Applications, (29 September 2004); https://doi.org/10.1117/12.559903
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KEYWORDS
Laser damage threshold
Multilayers
Ion beams
Aluminum
Oxides
Reflectivity
Tantalum
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