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18 October 2004 Compact debris-free EUV source for advanced mirror metrology
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A compact electron-based extreme ultraviolet (EUV) source for advanced at-wavelength mirror metrology is developed. The source concept is based on the transfer of advanced microfocus x-ray tube technology into the EUV spectral range. This allows the realization of a flexible, debris-free, and long-term stable EUV source. In the EUV tube, silicon targets are used to generate radiation at 13.5 nm. Detailed characteristics of the source performance are reported and different applications of the EUV tube in the field of at-wavelength mirror metrology are presented.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andre Egbert, Boris Tkachenko, Stefan Becker, and Boris N. Chichkov "Compact debris-free EUV source for advanced mirror metrology", Proc. SPIE 5533, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II, (18 October 2004);


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