18 October 2004 Microstitching interferometry for nanofocusing mirror optics
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Abstract
Metrology plays more important role than machining in surface figuring at sub-nanometer accuracy. The microstitch-ing interferometry based on a microscopic interferometer having peak-to-valley (p-v) height accuracy of sub-nanometer order and lateral resolution higher than 20 mm was developed to measure surface figures of X-ray mir-ror optics. In addition, the relative angle determinable stitching interferometry was also developed to measure surface profiles of elliptical mirrors to realize hard X-ray nanofocusing. By combining the two interferometies, the absolute measurement accuracy of approximately 3 nm (peak-to-valley) was achieved in the measurement of a cylindrical sur-face having the same curvature as the elliptically designed shape to enable nanofocusing.
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Hidekazu Mimura, Hirokatsu Yumoto, Satoshi Matsuyama, Kazuya Yamamura, Yasuhisa Sano, Kazumasa Ueno, Katsuyoshi Endo, Yuzo Mori, Makina Yabashi, Kenji Tamasaku, Yoshinori Nishino, Tetsuya Ishikawa, Kazuto Yamauchi, "Microstitching interferometry for nanofocusing mirror optics", Proc. SPIE 5533, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II, (18 October 2004); doi: 10.1117/12.567511; https://doi.org/10.1117/12.567511
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