New multilayer coating for 30.4-nm radiation

Ichiro Yoshikawa; Tetsunori Murachi

doi:10.1117/12.558976

18 October 2004 New multilayer coating for 30.4-nm radiation

Ichiro Yoshikawa, Tetsunori Murachi

Author Affiliations +

Proceedings Volume 5533, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II; (2004) https://doi.org/10.1117/12.558976
Event: Optical Science and Technology, the SPIE 49th Annual Meeting, 2004, Denver, Colorado, United States

Abstract

A multilayer coating of Mo/Si is usually used as an EUV optics for space science, especially for He-II (30.4nm) radiation, because it is highly stable under vacuum and atmosphere. The fairly high reflectivity of 15-20% was achieved. But space science community will need higher reflective coating at 30.4 nm radiation for the future satellite missions. In this work, for developing new multilayer mirror of He-II radiations, we report the design of a multilayer, consisting of a pair of Mg and SiC, and its fabrication, and result of the reflectance with the monthly degradation under the atmosphere circumstance.

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Ichiro Yoshikawa and Tetsunori Murachi "New multilayer coating for 30.4-nm radiation", Proc. SPIE 5533, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II, (18 October 2004); https://doi.org/10.1117/12.558976

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