10 November 2004 Study of irradiation damage of Sc/Si multilayer mirrors with a 46.9-nm tabletop laser
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We demonstrate the use of a tabletop capillary-discharge Ne-like Ar laser emitting nanosecond duration pulses at a wavelength of 46.9 nm for investigation of radiation damage mechanism and damage threshold in Sc/Si extreme ultraviolet multilayer mirrors. To vary the emission load at the surface of the mirror under test the intense 0.13 mJ laser pulses were focused using a spherical Sc/Si multilayer mirror to obtain fluences ranging from ~ 0.01 to >10 J/cm2. Single spots and large area patterns (2x2 mm2) were irradiated depending on the type of surface analysis technique employed. Damage threshold fluences of ~ 0.08 J/cm2 were measured for Sc/Si coatings deposited on both borosilicate glass and Si substrates, compared to the 0.7 J/cm2 found necessary to damage a bare Si substrate. The use of scanning and transmission electron microscopy, and small-angle X-ray diffraction techniques revealed the thermal nature of the damage mechanism. These results are relevant to the use of the Sc/Si mirrors in combination with newly developed high power EUV sources, and provide a benchmark for their further improvement.
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Georgiy O. Vaschenko, Georgiy O. Vaschenko, Michael E. Grisham, Michael E. Grisham, Carmen S. Menoni, Carmen S. Menoni, Jorge J. G. Rocca, Jorge J. G. Rocca, Yuriy P. Pershin, Yuriy P. Pershin, Evgeniy N. Zubarev, Evgeniy N. Zubarev, Dmitrii L. Voronov, Dmitrii L. Voronov, Viktoria A. Sevryukova, Viktoria A. Sevryukova, Valeriy V. Kondratenko, Valeriy V. Kondratenko, Alexander V. Vinogradov, Alexander V. Vinogradov, Igor A. Artioukov, Igor A. Artioukov, } "Study of irradiation damage of Sc/Si multilayer mirrors with a 46.9-nm tabletop laser", Proc. SPIE 5534, Fourth Generation X-Ray Sources and Optics II, (10 November 2004); doi: 10.1117/12.557952; https://doi.org/10.1117/12.557952

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