3 November 2004 Multilayer optics for Mo-radiation-based crystallography
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Abstract
We present an optic for laboratory Mo-Kalpha single crystal diffraction systems. The optic is comprised of two elliptically bent focusing multilayers, which are arranged in the Montel scheme. The paper shows the design and performance of the optic. A comparison with a graphite monochromator shows a five-fold intensity enhancement. Especially small and weakly diffracting crystals benefit from the large intensity produced by the optic, as illustrated by diffraction analyses.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Arjen B. Storm, Arjen B. Storm, Carsten Michaelsen, Carsten Michaelsen, Alexandra Oehr, Alexandra Oehr, Christian Hoffmann, Christian Hoffmann, "Multilayer optics for Mo-radiation-based crystallography", Proc. SPIE 5537, X-Ray Sources and Optics, (3 November 2004); doi: 10.1117/12.557153; https://doi.org/10.1117/12.557153
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