4 November 2004 Fabrication of parabolic nanofocusing x-ray lenses
Author Affiliations +
Abstract
We have fabricated planar parabolic lenses made of silicon and boron which have a focal distance in the range of a few millimetres at hard x-ray energies. Two silicon lenses were used in a crossed geometry to generate a microbeam with a lateral size of 160x107 nm2 at 15 keV. The focus size of 180 nm at 22 keV and at a distance from the synchrotron radiation source of 42 m was obtained with boron lens. The performance of the silicon lenses was improved by optimising the e-beam lithography and the etching parameters. In addition, we report on the microfabrication process of diamond as well as pyrolytic graphite lenses.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Olga Kurapova, Sebastian Feste, Malte Gather, Til Florian Gunzler, U. T. Hunger, Marion Kuhlmann, Jens Patommel, Christian G. Schroer, Bruno Lengeler, Andre van der Hart, "Fabrication of parabolic nanofocusing x-ray lenses", Proc. SPIE 5539, Design and Microfabrication of Novel X-Ray Optics II, (4 November 2004); doi: 10.1117/12.563921; https://doi.org/10.1117/12.563921
PROCEEDINGS
10 PAGES


SHARE
RELATED CONTENT

200-mm EPL stencil mask fabrication by using SOI substrate
Proceedings of SPIE (August 28 2003)
Deep reactive ion etch conditioning recipe
Proceedings of SPIE (December 30 2003)
Micromachining of ultrananocrystalline diamond
Proceedings of SPIE (September 28 2001)
0.25 µm Trench Etching By ECR Plasma
Proceedings of SPIE (August 01 1989)

Back to Top