Paper
4 November 2004 1.5-μm optical up-conversion: wafer fusion and related issues
Dayan Ban, Hui Luo, Hui-Chun Liu, Anthony J. SpringThorpe, Zbigniew R. Wasilewski, Andrew Bezinger, Alexei Bogdanov, Margaret Buchanan
Author Affiliations +
Abstract
Imaging devices working in the near infrared (NIR), especially in the so-called eye-safe range, i.e., around 1.5 mm, have become increasingly important in many military and commercial applications; these include night vision, covert surveillance, range finding and semiconductor wafer inspection. We proposed a new approach in which a wafer-fused optical up-converter, combined with a commercially available charged coupled device (CCD), functions as an infrared camera. The optical up-converter converts incoming infrared light into shorter wavelength radiation that can be efficiently detected by the silicon CCD (cutoff wavelength about 1 mm). An optical up-converter with high efficiency at room-temperature is critical for low cost and large-area infrared imaging applications. A prototype 1.5 mm optical up-converter based on wafer fusion technology has been successfully fabricated. The device consists of an InGaAs/InP pin photodetector and a GaAs/AlGaAs light emitting diode. Experimental results show that the end-to-end up-conversion efficiency is 0.0177 W/W at room-temperature, corresponding to an internal quantum up-conversion efficiency of 76%. In this paper, the design, fabrications and characterization of the optical up-conversion devices is presented. Issues related to device optimization, such as improving internal and external up-conversion efficiency, are addressed. Preliminary results demonstrate the room-temperature up-conversion imaging operation of a pixelated wafer-fused device.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Dayan Ban, Hui Luo, Hui-Chun Liu, Anthony J. SpringThorpe, Zbigniew R. Wasilewski, Andrew Bezinger, Alexei Bogdanov, and Margaret Buchanan "1.5-μm optical up-conversion: wafer fusion and related issues", Proc. SPIE 5543, Infrared Spaceborne Remote Sensing XII, (4 November 2004); https://doi.org/10.1117/12.561087
Lens.org Logo
CITATIONS
Cited by 1 scholarly publication.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Light emitting diodes

Internal quantum efficiency

Doping

Wafer-level optics

Quantum efficiency

Photodetectors

Semiconducting wafers

RELATED CONTENT

1.5 µm to 0.87 µm optical upconversion by wafer fusion
Proceedings of SPIE (December 20 2004)
Growth of InGaAlP HB LEDs in a large scale production...
Proceedings of SPIE (April 14 1999)
Photon upconversion devices
Proceedings of SPIE (May 17 2006)
Photon upconversion devices for imaging
Proceedings of SPIE (March 11 2008)

Back to Top