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1 September 2004 Peculiar properties of LC orientation by thin inorganic oxide films obtained by glow discharge plasma
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Proceedings Volume 5565, XV Conference on Liquid Crystals; (2004) https://doi.org/10.1117/12.581212
Event: XV Conference on Liquid Crystals, 2003, Zakopane, Poland
Abstract
Orienting properties of thin inorganic oxide films created by the method of reactive cathode sputtering in glow discharge plasma are demonstrated. The quality of homogeneous and twist alignment of nematic LC was evaluated by polarization microscopy methods. For comparison of orienting properties of silicon oxide films, the parameter of twist orientation quality was used, and its dependence on technological parameters of sputtering (such as cathode voltage, discharge current density, deposition angle, content of gas atmosphere) was shown. The morphologies of SiOx orienting layers deposited on substrates with different coatings are demonstrated.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yu. Kolomzarov, Pavel Oleksenko, Viktor Sorokin, P. Tytarenko, and R. Zelinskyy "Peculiar properties of LC orientation by thin inorganic oxide films obtained by glow discharge plasma", Proc. SPIE 5565, XV Conference on Liquid Crystals, (1 September 2004); https://doi.org/10.1117/12.581212
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