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Phase defect printability and mask inspection capability of 65-nm technology node Alt-PSM for ArF lithography (Photomask Japan Best Paper)
A reticle quality management strategy in wafer fabs addressing progressive mask defect growth problem at low-k1 lithography
Integrating RET and mask manufacturability in designs for local interconnect for sub-100-nm trenches
Reduction of radial CD errors and Cr loading effects in 90-nm binary NCAR mask process through chrome etch DOE
FEP-171 resist thickness optimization and dry etch screening on NTAR7 chrome substrates for Sigma7300 DUV laser pattern generator
Full-chip manufacturing reliability check and correction (MRC2): a first step toward design for manufacturability with low k1 lithography
Resist model calibration using 2D developed patterns for low-k1 process optimization and wafer printing predictions