PROCEEDINGS VOLUME 5567
PHOTOMASK TECHNOLOGY | 13-17 SEPTEMBER 2004
24th Annual BACUS Symposium on Photomask Technology
PHOTOMASK TECHNOLOGY
13-17 September 2004
Monterey, California, United States
Keynote Session
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Mask Inspection I
Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, pg 36 (6 December 2004); doi: 10.1117/12.579749
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Mask Inspection II
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Design and Process Integration/DFM
Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, pg 107 (6 December 2004); doi: 10.1117/12.569398
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Advanced Mask Etch
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Resist and Processing Technologies
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Mask Substrates and Materials
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Mask Patterning
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Mask Business and Management
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Mask Data Preparation and MRC
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Simulation
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Repair
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Cleaning
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Maskless Lithography
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Strong Phase Shift
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Optical Proximity Correction and Models
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CPL and HT-PSM Technologies
Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, pg 659 (6 December 2004); doi: 10.1117/12.570217
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Advanced Resolution Enhancement Technologies
Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, pg 700 (6 December 2004); doi: 10.1117/12.569175
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EUV Substrates
Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, pg 741 (6 December 2004); doi: 10.1117/12.569075
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EUV Inspection
Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, pg 791 (6 December 2004); doi: 10.1117/12.568379
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Poster Session
Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, pg 943 (6 December 2004); doi: 10.1117/12.569849
Emerging Lithographies
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Metrology
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Poster Session
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Design and Process Integration/DFM
Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, pg 147 (6 December 2004); doi: 10.1117/12.569904
Poster Session
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Mask Business and Management
Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, pg 330 (6 December 2004); doi: 10.1117/12.569346
Poster Session
Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, pg 1035 (6 December 2004); doi: 10.1117/12.569375
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