6 December 2004 Calibration of the registration metrology systems
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Abstract
Tighter lithography requirements are increasing the challenges for mask registration metrology. Demands on calibration will increase as tool specific calibration need to significantly improve to enable accurate plate quality assessment and adequate matching between multiple writer and metrology system. We present results of calibration study conducted on Leica LMS IPRO 2 and LMS IPRO1. Two different calibration techniques were used to match the tool grid to absolute Cartesian coordinate system. The impact of the two calibration techniques on tool matching is summarized. The results are used to make recommendations on improving calibration methodology.
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Mahesh Chandramouli, Mahesh Chandramouli, Yulia O. Korobko, Yulia O. Korobko, } "Calibration of the registration metrology systems", Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); doi: 10.1117/12.568245; https://doi.org/10.1117/12.568245
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