Characterization of defect detection sensitivity in inspection of mask substrates and blanks for extreme-ultraviolet lithography

Edita Tejnil; Eric M. Gullikson; Alan R. Stivers

doi:10.1117/12.569849

6 December 2004 Characterization of defect detection sensitivity in inspection of mask substrates and blanks for extreme-ultraviolet lithography

Edita Tejnil, Eric M. Gullikson, Alan R. Stivers

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Proceedings Volume 5567, 24th Annual BACUS Symposium on Photomask Technology; (2004) https://doi.org/10.1117/12.569849
Event: Photomask Technology, 2004, Monterey, California, United States

Abstract

Defect detection sensitivity of a multi-beam confocal inspection system operating at a wavelength of 488 nm is characterized using experiments and image modeling. Experimental data on defect sensitivity are reported for programmed defects on mask substrates and blanks that are being developed for extreme ultraviolet lithography. The effects of sample surface roughness on the detection sensitivity and signal-to-noise levels are quantified. Theoretical analysis of confocal imaging of defects is in excellent agreement with measured defect images. Modeling is used to predict inspection sensitivity for defects commonly found on mask blanks.

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Edita Tejnil, Eric M. Gullikson, and Alan R. Stivers "Characterization of defect detection sensitivity in inspection of mask substrates and blanks for extreme-ultraviolet lithography", Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); https://doi.org/10.1117/12.569849

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