6 December 2004 Development of defect inspection and repair systems for EPL mask infrastructure
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Abstract
Selete is developing a series of defect inspection and repair systems for electron projection lithography (EPL) stencil mask infrastructure, that includes tools and software development, and also verification by EPL exposure systems. The work is carried out in collaboration with Dai Nippon Printing, Toppan Printing and HOYA. A system for defect inspection of EPL stencil mask is developed with TOKYO SEIMITSU and HOLON. Another system for defect repairs is developed with SII NanoTechnology. The performances of these systems need to be verified for their further improvement and optimization. In this paper, we verified a series of defect inspection and repair systems through a sequential process. We can say that EPL mask infrastructure is established and our work has made significant contribution to it.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jiro Yamamoto, Jiro Yamamoto, Nobuyuki Iriki, Nobuyuki Iriki, Hiroshi Arimoto, Hiroshi Arimoto, } "Development of defect inspection and repair systems for EPL mask infrastructure", Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); doi: 10.1117/12.578652; https://doi.org/10.1117/12.578652
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