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6 December 2004 Evaluation of a new-generation photomask develop system for CAR
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Abstract
A new photomask develop tool designed by Tokyo Electron Limited (TEL) with wafer puddle technology was evaluated at the Advanced Mask Technology Center (AMTC) in Dresden, Germany. Parameters selected for this evaluation were resist dark loss uniformity, critical dimension (CD) uniformity, loading, linearity, resist cross sectional images, and defects using chemically amplified resists (CARs) exposed with DUV (l=257nm) and 50KeV e-beam pattern generators. Implementing wafer puddle technology to photomask developing was not a simple, straightforward process. Standard CAR puddle recipes for wafer developing were inadequate to match CDU requirements for photomasks at the 130nm technology node using DUV exposure. While the results were disappointing, the TEL alpha develop tool cannot be held entirely responsible. Other, non-develop tool related factors such as resist, substrate, coating bake temperature and time, lithography tool, and post exposure bake temperature and time, all contributed to the final post develop results. Indeed, other CAR/substrate combinations exposed at 50keV e-beam and processed on the TEL alpha develop tool were markedly better in CD performance when compared to DUV results. The AMTC has recently taken delivery of a full scale, production worthy, TEL photomask develop tool for use at future technology nodes.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Rusty Cantrell, Martin Tschinkl, Axel Feicke, Wolfram Porsche, Gaston Lee, Tatsuhito Kotoda, Peter Tichy, Takahiro Fukai, Shigenori Kamei, and Hiroshi Asai "Evaluation of a new-generation photomask develop system for CAR", Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); https://doi.org/10.1117/12.568393
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