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6 December 2004 IP protection of mask data by rebuilding the design hierarchy using OASIS format
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Abstract
In this paper we present new development of intellectual properties(IP) protection software using OASIS format. By taking advantage of repetition presentation of OASIS, it becomes possible to express arrayed patterns without any generation of new cells, which also brings less overhead and further compaction of the result file. As a result, we could rebuild the hierarchy without cell generation and reduce the output file size. The experimental results show that there are no redundant cells generated and the file size has become 5 to 8 times smaller than conventional methods.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kokoro Kato, Kuninori Nishizawa, Tadao Inoue, and Anto Yasaka "IP protection of mask data by rebuilding the design hierarchy using OASIS format", Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); https://doi.org/10.1117/12.577807
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