6 December 2004 Immersion mask inspection with hybrid-microscopic systems at 193 nm
Author Affiliations +
The capability of a high NA, large working distance, microscope objective was demonstrated by investigating different mask features. The microscope objective is based on a hybrid concept combining diffractive and refractive optical elements. Resolution down to 125 nm lines and spaces (L/S) is demonstrated by investigating periodic chrome on glass structures. A significant additional improvement of the resolution is achieved by inducing a solid immersion lens (SIL).
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Robert Brunner, Alexander Menck, Reinhard Steiner, Gerd Buchda, Steffen Weissenberg, Uwe Horn, Axel M. Zibold, "Immersion mask inspection with hybrid-microscopic systems at 193 nm", Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); doi: 10.1117/12.569019; https://doi.org/10.1117/12.569019

Back to Top