6 December 2004 Immersion mask inspection with hybrid-microscopic systems at 193 nm
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Abstract
The capability of a high NA, large working distance, microscope objective was demonstrated by investigating different mask features. The microscope objective is based on a hybrid concept combining diffractive and refractive optical elements. Resolution down to 125 nm lines and spaces (L/S) is demonstrated by investigating periodic chrome on glass structures. A significant additional improvement of the resolution is achieved by inducing a solid immersion lens (SIL).
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Robert Brunner, Robert Brunner, Alexander Menck, Alexander Menck, Reinhard Steiner, Reinhard Steiner, Gerd Buchda, Gerd Buchda, Steffen Weissenberg, Steffen Weissenberg, Uwe Horn, Uwe Horn, Axel M. Zibold, Axel M. Zibold, } "Immersion mask inspection with hybrid-microscopic systems at 193 nm", Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); doi: 10.1117/12.569019; https://doi.org/10.1117/12.569019
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