6 December 2004 Immersion mask inspection with hybrid-microscopic systems at 193 nm
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The capability of a high NA, large working distance, microscope objective was demonstrated by investigating different mask features. The microscope objective is based on a hybrid concept combining diffractive and refractive optical elements. Resolution down to 125 nm lines and spaces (L/S) is demonstrated by investigating periodic chrome on glass structures. A significant additional improvement of the resolution is achieved by inducing a solid immersion lens (SIL).
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Robert Brunner, Robert Brunner, Alexander Menck, Alexander Menck, Reinhard Steiner, Reinhard Steiner, Gerd Buchda, Gerd Buchda, Steffen Weissenberg, Steffen Weissenberg, Uwe Horn, Uwe Horn, Axel M. Zibold, Axel M. Zibold, } "Immersion mask inspection with hybrid-microscopic systems at 193 nm", Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); doi: 10.1117/12.569019; https://doi.org/10.1117/12.569019

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