Translator Disclaimer
6 December 2004 Joining the design and mask flows for better and cheaper masks
Author Affiliations +
Abstract
Today's design-manufacturing interfaces have only minimal information exchange. Lack of information on either side leads to under-performance due to too much guardbanding, and increased mask cost and increased turnaround time due to over-correction. In this work we present techniques that simultaneously utilize design and manufacturing information to improve mask quality and reduce mask cost.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Puneet Gupta, Andrew B. Kahng, Chul-Hong Park, P. Sharma, Dennis M. C. Sylvester, and Jun Yang "Joining the design and mask flows for better and cheaper masks", Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); https://doi.org/10.1117/12.594095
PROCEEDINGS
12 PAGES


SHARE
Advertisement
Advertisement
Back to Top