6 December 2004 Mask defect reduction through automated pellicle mounting
Author Affiliations +
At IBM’s Mask House, we deigned, installed, and evaluated a fully automated pellicle mounting tool. Features include very low particulate levels, ability to mount a wide variety of pellicles, ease of operation, and pellicle and mask inspection capability. During an evaluation period, pellicles were mounted both with this fully automated tool and with a semiautomatic tool. The fully automated tool showed good reliability (>95% availability) and a 2X lower incidence of foreign material contemination as compared with the semiautomatic tool.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Richard E. Wistrom, Richard E. Wistrom, Dennis Hayden, Dennis Hayden, Timothy Neary, Timothy Neary, } "Mask defect reduction through automated pellicle mounting", Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); doi: 10.1117/12.569061; https://doi.org/10.1117/12.569061


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