6 December 2004 Overcoming substrate defect decoration effects in EUVL mask blank development
Author Affiliations +
Proceedings Volume 5567, 24th Annual BACUS Symposium on Photomask Technology; (2004); doi: 10.1117/12.569271
Event: Photomask Technology, 2004, Monterey, California, United States
Abstract
Mask blanks for extreme ultraviolet lithography (EUVL) are fabricated by depositing Mo/Si multilayer films on 6” square super polished substrates. These mask blanks must be almost defect-free and development of a suitable multiplayer deposition tool and process is crucial for the commercialization of EUVL. We will show that using current, real-world quartz substrates and our state-of-the-art defect inspection tool, that substrate defect decoration is an obstacle; this means that there appear to be many non-detectable substrate defects that become detectable once a reflective coating is deposited. This makes it very challenging to conduct accurate defect root cause analysis experiments. We have overcome this obstacle: it entails characterizing an already coated substrate for defects, which provides a suitable reference from which to measure the defects in the multilayer coating that is subsequently applied. We will demonstrate that this is a viable technique and that it enables a suitable defect baseline to be obtained; this is crucial to performing accurate root cause analysis experiments for potential defect sources/mechanisms.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Patrick A. Kearney, Rajul V. Randive, Andy Ma, David Krick, Al Weaver, Ira Reiss, Daniel Abraham, Paul B. Mirkarimi, E. Spiller, "Overcoming substrate defect decoration effects in EUVL mask blank development", Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); doi: 10.1117/12.569271; https://doi.org/10.1117/12.569271
PROCEEDINGS
7 PAGES


SHARE
KEYWORDS
Multilayers

Extreme ultraviolet lithography

Inspection

Photomasks

Coating

Reflectivity

Deposition processes

RELATED CONTENT

Defect printability and inspection of EUVL mask
Proceedings of SPIE (December 06 2004)
EUV mask defects and their removal
Proceedings of SPIE (April 16 2012)
EUVL masks: requirements and potential solutions
Proceedings of SPIE (July 01 2002)
Actinic inspection of sub-50 nm EUV mask blank defects
Proceedings of SPIE (May 03 2007)

Back to Top