Phase standard based on profilometer metrology standard

Gregory P. Hughes; Cindy Goodman; Gunter Antesberger; Stefan Burges; Troy B. Morrison; Alex H. Buxbaum

doi:10.1117/12.581222

6 December 2004 Phase standard based on profilometer metrology standard

Gregory P. Hughes, Cindy Goodman, Gunter Antesberger, Stefan Burges, Troy B. Morrison, Alex H. Buxbaum

Proceedings Volume 5567, 24th Annual BACUS Symposium on Photomask Technology; (2004) https://doi.org/10.1117/12.581222
Event: Photomask Technology, 2004, Monterey, California, United States

Abstract

A NIST traceable phase1 shift standard has been designed, fabricated, and tested on three phase shift measurement tools using different wavelengths. By using the fundamentals of NIST traceable step height, quartz index, and the understanding of the illumination optics of the Lasertec phase metrology tool, a phase standard has been created which can be used to calibrate Lasertec phase metrology tools. The pattern that is used is compatible with the recommended best practices for calibrating and measuring step heights and phase on the Lasertec tools. The mask is made with multiple depths. The three mask depths allow for the mask to be calibrated to three NIST traceable depth heights. This was done using the FEI SNP XT depth metrology tool. Since the mask format is mask based (6x250 Cr on quartz), it can be easily used on mask manufacturing metrology systems. The depths are targeted at the 180-degree phase shift for 157nm, 193nm, and 248nm lithography. The mask can be used to set targets and check the linearity of the phase metrology tools. The patterns are compatible with AFM and Profilometer depth metrology tools as well as multiple Lasertec spot sizes and shearing distances. The quartz depths are fabricated using a wet quartz etch process. The wet etch minimizes the quartz roughness and removes that error source from the metrology. The pattern is also arrayed so that multiple sites can be used to confirm the metrology and the prime measurement site could be changed if there was a suspicion of pattern damage or contamination.

Citation Download Citation

Gregory P. Hughes, Cindy Goodman, Gunter Antesberger, Stefan Burges, Troy B. Morrison, and Alex H. Buxbaum "Phase standard based on profilometer metrology standard", Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); https://doi.org/10.1117/12.581222

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available