6 December 2004 Phase standard based on profilometer metrology standard
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A NIST traceable phase1 shift standard has been designed, fabricated, and tested on three phase shift measurement tools using different wavelengths. By using the fundamentals of NIST traceable step height, quartz index, and the understanding of the illumination optics of the Lasertec phase metrology tool, a phase standard has been created which can be used to calibrate Lasertec phase metrology tools. The pattern that is used is compatible with the recommended best practices for calibrating and measuring step heights and phase on the Lasertec tools. The mask is made with multiple depths. The three mask depths allow for the mask to be calibrated to three NIST traceable depth heights. This was done using the FEI SNP XT depth metrology tool. Since the mask format is mask based (6x250 Cr on quartz), it can be easily used on mask manufacturing metrology systems. The depths are targeted at the 180-degree phase shift for 157nm, 193nm, and 248nm lithography. The mask can be used to set targets and check the linearity of the phase metrology tools. The patterns are compatible with AFM and Profilometer depth metrology tools as well as multiple Lasertec spot sizes and shearing distances. The quartz depths are fabricated using a wet quartz etch process. The wet etch minimizes the quartz roughness and removes that error source from the metrology. The pattern is also arrayed so that multiple sites can be used to confirm the metrology and the prime measurement site could be changed if there was a suspicion of pattern damage or contamination.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Gregory P. Hughes, Gregory P. Hughes, Cindy Goodman, Cindy Goodman, Gunter Antesberger, Gunter Antesberger, Stefan Burges, Stefan Burges, Troy B. Morrison, Troy B. Morrison, Alex H. Buxbaum, Alex H. Buxbaum, "Phase standard based on profilometer metrology standard", Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); doi: 10.1117/12.581222; https://doi.org/10.1117/12.581222

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