6 December 2004 Writing strategy and electron-beam system with an arbitrarily shaped beam
Author Affiliations +
Abstract
The greatly increased complexity of modern masks has in turn led to increased write times and cost of the masks. Any opportunity to decrease write time while providing the required accuracy of the fabricated pattern is highly beneficial. A writing strategy using an arbitrarily shaped beam (ASB) results in a considerably smaller number of flashes to write a complex pattern compared to other strategies. The design of an ASB system is proposed. The ASB electron-beam column is similar to that of a variable-shaped beam system, except for a modified beam-shaping block. This suggests the relatively easy integration of an ASB column. The throughput of an ASB system is a few times greater than the throughput of other systems, except for patterns with low coverage or simple geometries. In addition to the throughput advantages, an ASB system enables higher accuracy, including the feasibility of writing features according to "ideal" optical proximity correction.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sergey Babin, Sergey Babin, } "Writing strategy and electron-beam system with an arbitrarily shaped beam", Proc. SPIE 5567, 24th Annual BACUS Symposium on Photomask Technology, (6 December 2004); doi: 10.1117/12.568677; https://doi.org/10.1117/12.568677
PROCEEDINGS
7 PAGES


SHARE
RELATED CONTENT

Mask data processing in the era of multibeam writers
Proceedings of SPIE (October 20 2014)
Writing accuracy of EBM-3500 electron-beam mask writing system
Proceedings of SPIE (September 04 2001)
ArF lithography for printing 100 nm gates on low volume...
Proceedings of SPIE (September 13 2001)
Raster scan patterning solution for 100 and 70 nm...
Proceedings of SPIE (July 31 2002)
E beam shot count estimation at 32 nm HP and...
Proceedings of SPIE (May 11 2009)
Future mask writers requirements for the sub-10nm node era
Proceedings of SPIE (November 07 2012)

Back to Top