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20 December 2004 Measurement of effective index change with UV-induced Bragg gratings and applications
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Abstract
A method of Bragg gratings written in silica-on-silicon planar waveguides to be used to monitor the overall uniformity of the waveguides and grating processing is presented. By measuring the shift of Bragg wavelength with UV exposure time, the initial effective index nOeff and birefringence B0 of the planar waveguides are measured accurately. With one phase mask, Bragg gratings induced on different waveguides with widths that vary from 4.6 to 8.8 μm, result in variations of NOeff and βO of 1.5 x 10-3/μm and 1 x 10-4/μm, respectively. The result is used as a way of improving control over the waveguide dimensions obtained from the photolithographic and RIE processes, and optimizing the design of ridge waveguide structures to compensate the waveguide birefringence. This will improve the quality of the PLCs that include symmetric Bragg grating structures: MZI-OADM etc. By writing Bragg gratings on the linear taper planar waveguide, a chirped grating response is realized.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xiaoli Dai, Stephen James Mihailov, Claire L. Callender, Chantal Blanchetiere, and Jia Jiang "Measurement of effective index change with UV-induced Bragg gratings and applications", Proc. SPIE 5577, Photonics North 2004: Optical Components and Devices, (20 December 2004); https://doi.org/10.1117/12.566230
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