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20 December 2004 New fabrication technology for photonic crystal waveguides
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Abstract
We have developed a deep ultraviolet (DUV) lithography technique for fabricating super dense silicon based photonic crystals. Binary mask is used to create nano scale patterns of very high density. Based on the simulation, photonic crystals with both square and triangular lattice of air cylinders are designed and fabricated to work in communication frequency range (λ within 1.3 to 1.55μm) on amorphous silicon. In order to pattern circular hole we designed different kind of polygons on the mask and layout pattern was under sized at constant pitch. Bottom anti reflection coating (BARC) recipe was developed to improve circularity of the pattern and reduce interhole spacing.
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Sohan Singh Mehta, B. Ramana Murthy, Zhao Hui, * Suryani, Wei Ji, Mahadevan K. Iyer, and My T. Doan "New fabrication technology for photonic crystal waveguides", Proc. SPIE 5577, Photonics North 2004: Optical Components and Devices, (20 December 2004); https://doi.org/10.1117/12.567602
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