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17 March 2005 Diagnostics for laser plasma EUV sources
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Proceedings Volume 5580, 26th International Congress on High-Speed Photography and Photonics; (2005) https://doi.org/10.1117/12.597349
Event: 26th International Congress on High-Speed Photography and Photonics, 2004, Alexandria, Virginia, United States
Abstract
A high repetition-rate laser plasma source, possessing distinct radiation and particle emission characteristics, is now a principal candidate light source for the next generation of technology for the fabrication of computer chips. For these sources to satisfy this critical need they will need to meet unprecedented levels of performance, stability and lifetime. We review here some of the principal diagnostics of the EUV radiation that are now being utilized in the metrology, spectroscopy and imaging of these sources.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Martin C. Richardson, Chiew-Seng Koay, Kazutoshi Takenoshita, C. Keyser, Robert Bernath, Simi George, and Somsak Teerawattanasook "Diagnostics for laser plasma EUV sources", Proc. SPIE 5580, 26th International Congress on High-Speed Photography and Photonics, (17 March 2005); https://doi.org/10.1117/12.597349
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