17 March 2005 Ultrafast three-dimensional microscopy of laser photothermal imaging materials
Author Affiliations +
Proceedings Volume 5580, 26th International Congress on High-Speed Photography and Photonics; (2005) https://doi.org/10.1117/12.586018
Event: 26th International Congress on High-Speed Photography and Photonics, 2004, Alexandria, Virginia, United States
Abstract
Time-resolved microscopy in a variety of configurations is used for three-dimensional imaging of laser photothermal materials used in offset lithographic computer-to-plate printing applications. Materials having an ink-repelling silicone layer and either a metallic absorbing layer or an energetic absorbing layer are studied. The energetic layers result in lower exposure thresholds when 10 microsecond and 2 microsecond duration near-IR laser pulses are used. The images explain the mechanism of threshold lowering, as a result of hot gas from the energetic layer causing the silicone layer to balloon. The expanding balloon results in less laser energy needed to produce an exposed spot.
© (2005) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hyunung Yu, F. Richard Kearney, Dana D. Dlott, "Ultrafast three-dimensional microscopy of laser photothermal imaging materials", Proc. SPIE 5580, 26th International Congress on High-Speed Photography and Photonics, (17 March 2005); doi: 10.1117/12.586018; https://doi.org/10.1117/12.586018
PROCEEDINGS
10 PAGES


SHARE
Back to Top