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21 October 2004 Pt, Pd, Ni metallic thin films deposited by pulsed laser ablation
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Proceedings Volume 5581, ROMOPTO 2003: Seventh Conference on Optics; (2004) https://doi.org/10.1117/12.582895
Event: ROMOPTO 2003: Seventh Conference on Optics, 2003, Constanta, Romania
Abstract
We have investigated thin films of Ni, Pt, Pd, Ni-Pt and Ni-Pd deposited by pulsed laser ablation. Our study was focused on the correlation of layer morphology and composition vs. synthesis parameters (material, laser fluence and wavelength). In order to obtain bimetallic films we alternatively irradiated two different metal targets. A Nd:YAG laser (λ = 355 and 532 nm, 5 ns pulse duration, fluence 15 - 30 J/cm2) was used. Film analysis was made by AFM and RBS. The synthesized layers had a roughness (Ra) between 15 and 40 nm for Pt and Pd and between 80 and 120 nm for Ni. The rate deposition was in the range of 0.04 - 0.8 Å. In the composite layers, in condition of equally radiated targets, the Ni/Pd at. concentration was 50/50%, while for the Ni/Pt layer was 30/70%.
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Nicusor Doinel Scarisoreanu, Ionut Nicolae, Constantin Grigoriu, Maria Dinescu, Makoto Hirai, Tsuneo Suzuki, and Kiyoshi Yatsui "Pt, Pd, Ni metallic thin films deposited by pulsed laser ablation", Proc. SPIE 5581, ROMOPTO 2003: Seventh Conference on Optics, (21 October 2004); https://doi.org/10.1117/12.582895
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