7 December 2004 Fabrication of a waveguide for biomedical applications using novel micromachining techniques
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Proceedings Volume 5588, Smart Medical and Biomedical Sensor Technology II; (2004) https://doi.org/10.1117/12.571718
Event: Optics East, 2004, Philadelphia, Pennsylvania, United States
Abstract
The fabrication parameters necessary for the development of waveguides that transmit energy from deep ultraviolet to infrared range on wide band gap semiconductor thin film is discussed. Such waveguides in conjunction with microfluidic systems may be used for a spatial and temporal drug delivery in neural tissue. These waveguides may also be suitably modified and employed for novel applications like lab-on-a-chip technologies for Raman Spectroscopy and high speed telecommunication optical switches. Highly textured AlN thin films are grown on C-plane sapphire with high refractive index buffer layer by plasma source molecular beam epitaxy (PSMBE). Analytical measurements such as atomic force microscopy (AFM), ultraviolet spectroscopy and X-ray diffraction, were used to characterize surface morphology and crystalline structure of these films. The fabrication of waveguide structures was performed using laser micromachining with a KrF Excimer laser of wavelength 248 nm and pulse duration of 25ns. Waveguide etching rate for the AlN thin films is investigated as a function laser pulse energy and number of pulses. It is found that etching rate increases almost linearly with both--the pulse energy and number of pulses.
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Mona R. Safadi, Mona R. Safadi, Andrew J. Scott, Andrew J. Scott, Jagdish Thakur, Jagdish Thakur, Gregory W. Auner, Gregory W. Auner, } "Fabrication of a waveguide for biomedical applications using novel micromachining techniques", Proc. SPIE 5588, Smart Medical and Biomedical Sensor Technology II, (7 December 2004); doi: 10.1117/12.571718; https://doi.org/10.1117/12.571718
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