19 January 2005 From microchannels to nanochannels in a bilayer resist
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Proceedings Volume 5592, Nanofabrication: Technologies, Devices, and Applications; (2005); doi: 10.1117/12.572068
Event: Optics East, 2004, Philadelphia, Pennsylvania, United States
Abstract
This paper describes the use of a unique combination of an environmentally stable chemically amplified photoresist (UV113, Shipley) and a copolymer of methyl styrene and chloromethyl acrylate P(MS/CMA) resist (ZEP520, Zeon), without any additional intermediate layers, in the fabrication of micro- and nanochannels. The two resists used are innocuous to each other during the designed process flow, providing flexibility, high resolution, greater throughput and ease of use. We have also determined that the maximum channel length is limited by diffusion and mass transport effects, and that sub-100 nm nanochannels can be obtained with 30 micron lengths.
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Leonidas E. Ocola, Aaron Stein, "From microchannels to nanochannels in a bilayer resist", Proc. SPIE 5592, Nanofabrication: Technologies, Devices, and Applications, (19 January 2005); doi: 10.1117/12.572068; https://doi.org/10.1117/12.572068
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KEYWORDS
Diffusion

Photoresist processing

Photomicroscopy

Photoresist materials

Polymers

Electron beam lithography

Plasma

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