1 November 2004 Gabor filters and SVM classifier for pattern wafer segmentation
Author Affiliations +
Proceedings Volume 5607, Wavelet Applications in Industrial Processing II; (2004) https://doi.org/10.1117/12.581242
Event: Optics East, 2004, Philadelphia, Pennsylvania, United States
Abstract
In the last decade, the accessibility of inexpensive and powerful computers has allowed true digital holography to be used for industrial inspection using microscopy. This technique allows capturing a complex image of a scene (i.e. containing magnitude and phase), and reconstructing the phase and magnitude information. Digital holograms give a new dimension to texture analysis since the topology information can be used as an additional way to extract features. This new technique can be used to extend previous work on image segmentation of patterned wafers for defect detection. This paper presents a comparison between the features obtained using Gabor filtering on complex images under illumination and focus variations.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Pierrick T. Bourgeat, Fabrice Meriaudeau, Patrick Gorria, Kenneth W. Tobin, "Gabor filters and SVM classifier for pattern wafer segmentation", Proc. SPIE 5607, Wavelet Applications in Industrial Processing II, (1 November 2004); doi: 10.1117/12.581242; https://doi.org/10.1117/12.581242
PROCEEDINGS
8 PAGES


SHARE
Back to Top