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30 November 2004 Integrated micromachined filters for wavelength division multiplexing
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Using deep-dry etching techniques it is possible to realise filters for use in optical telecommunication based on silicon/air cavities with a high degree of finesse, and which are oriented substantially perpendicular to the surface of the silicon substrate. This geometry is well suited to their incorporation in hollow-waveguides or within ridge waveguide structures. The optical characteristics of such devices are determined by a number of factors, including the designs of the optical cavities and the degree of surface perfection achievable by the deep-dry etching process.
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Keith L. Lewis, Gilbert W. Smith, and Mark E. McNie "Integrated micromachined filters for wavelength division multiplexing", Proc. SPIE 5618, Integrated Optical Devices, Nanostructures, and Displays, (30 November 2004);

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